Negative photoresist

Mandarin:
负性光刻胶
Explanation in English Language (EN):
A type of photoresist that becomes less soluble in a developer solution when exposed to light. The unexposed areas are dissolved away, leaving the exposed areas as the pattern.
Explanation in Mandarin (ZH):
暴露在光线下时在显影剂溶液中的溶解度降低的光刻胶类型。未曝光的区域被溶解掉,留下曝光的区域作为图案。(bào lù zài guāng xiàn xià shí zài xiǎn yǐng jì róng yè zhōng de róng jiě dù jiàng dī de guāng kè jiāo lèi xíng. wèi bào guāng de qū yù bèi róng jiě diào, liú xià bào guāng de qū yù zuò wéi tú àn.)
International Phonetic Alphabet (IPA)
- Definition: A standardized system of symbols used to represent the sounds of spoken language.
- Purpose: Helps linguists, language learners, and educators accurately describe pronunciation across languages.
- Example: The word “hello” in British English is transcribed as /həˈləʊ/ in IPA.