Positive photoresist
正性光刻胶
Explanation (EN)
A type of photoresist that becomes more soluble in a developer solution when exposed to light. The exposed areas are dissolved away, leaving the unexposed areas as the pattern.
Explanation (ZH)
暴露在光线下时，在显影剂溶液中溶解度更高的光刻胶类型。曝光区域被溶解掉，留下未曝光区域作为图案。(Bào lù zài guāng xiàn xià shí, zài xiǎn yǐng jì róng yè zhōng róng jiě dù gèng gāo de guāng kè jiāo lèi xíng. bào guāng qū yù bèi róng jiě diào, liú xià wèi bào guāng qū yù zuò wéi tú àn.)
About the IPA
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Example: the word "hello" in British English is transcribed as /həˈləʊ/ in IPA.