Photoresist
光刻胶
Explanation (EN)
A light-sensitive material used in photolithography. Photoresists undergo a change in solubility when exposed to light, allowing for the creation of patterns on a substrate.
Explanation (ZH)
光刻中使用的光敏材料。光刻胶在曝光时会发生溶解度变化，从而允许在基板上创建图案。(guāng kè zhōng shǐ yòng de guāng mǐn cái liào. guāng kè jiāo zài bào guāng shí huì fā shēng róng jiě dù biàn huà, cóng ér yǔn xǔ zài jī dì shàng chuàng jiàn tú àn.)
About the IPA
The International Phonetic Alphabet is a standardized system of symbols used to represent the sounds of spoken language.
It helps linguists, language learners, and educators accurately describe pronunciation across languages.
Example: the word "hello" in British English is transcribed as /həˈləʊ/ in IPA.