Photoresist
Mandarin:
光刻胶
光刻胶
Explanation in English Language (EN):
A light-sensitive material used in photolithography. Photoresists undergo a change in solubility when exposed to light, allowing for the creation of patterns on a substrate.
A light-sensitive material used in photolithography. Photoresists undergo a change in solubility when exposed to light, allowing for the creation of patterns on a substrate.
Explanation in Mandarin (ZH):
光刻中使用的光敏材料。光刻胶在曝光时会发生溶解度变化，从而允许在基板上创建图案。(guāng kè zhōng shǐ yòng de guāng mǐn cái liào. guāng kè jiāo zài bào guāng shí huì fā shēng róng jiě dù biàn huà, cóng ér yǔn xǔ zài jī dì shàng chuàng jiàn tú àn.)
光刻中使用的光敏材料。光刻胶在曝光时会发生溶解度变化，从而允许在基板上创建图案。(guāng kè zhōng shǐ yòng de guāng mǐn cái liào. guāng kè jiāo zài bào guāng shí huì fā shēng róng jiě dù biàn huà, cóng ér yǔn xǔ zài jī dì shàng chuàng jiàn tú àn.)
International Phonetic Alphabet (IPA)
- Definition: A standardized system of symbols used to represent the sounds of spoken language.
- Purpose: Helps linguists, language learners, and educators accurately describe pronunciation across languages.
- Example: The word “hello” in British English is transcribed as /həˈləʊ/ in IPA.
- Definition: A standardized system of symbols used to represent the sounds of spoken language.
- Purpose: Helps linguists, language learners, and educators accurately describe pronunciation across languages.
- Example: The word “hello” in British English is transcribed as /həˈləʊ/ in IPA.