SU-8
SU-8 光刻胶
Explanation (EN)
A negative photoresist commonly used in microfabrication. It's known for its high aspect ratio and chemical resistance, making it suitable for creating high-resolution structures.
Explanation (ZH)
常用于微加工的负性光刻胶。它以其高深宽比和耐化学性而闻名，使其适用于制造高分辨率结构。(cháng yòng yú wēi jiā gōng de fù xìng guāng kè jiāo. tā yǐ qí gāo shēn kuān bǐ hé nài huà xué xìng ér wén míng, shǐ qí shì yòng yú zhì zào gāo fēn biàn lǜ jié gòu.)
About the IPA
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Example: the word "hello" in British English is transcribed as /həˈləʊ/ in IPA.